High mobility Ge pMOSFETs with amorphous Si passivation: impact of surface orientation
نویسندگان
چکیده
منابع مشابه
Superior reliability of high mobility (Si)Ge channel pMOSFETs
0167-9317/$ see front matter 2013 Elsevier B.V. A http://dx.doi.org/10.1016/j.mee.2013.03.001 ⇑ Corresponding author. E-mail address: [email protected] (J. Franco) With a significantly reduced Negative Bias Temperature Instability (NBTI), SiGe channel pMOSFETs promise to virtually eliminate this reliability issue for ultra-thin EOT devices. The intrinsically superior NBTI robustness of the ...
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ژورنال
عنوان ژورنال: Nanoscale Research Letters
سال: 2019
ISSN: 1931-7573,1556-276X
DOI: 10.1186/s11671-018-2847-0